SPIN ION technologies (www.spin-ion.com), a spin-off company from the university of Paris-Sud and CNRS in France,created in 2017, has developed a proprietary back end process solution (3 patents) to treat magnetic materials for the purpose of enhancing their performances, reducing manufacturing costs and improving yield for both Hard Disk Drive and MRAM applications. Spin-Ion Technologies process technology is based on the application of light ion irradiation in order to enhance the structure of ultra-thin magnetic films at the atomic scale. The technology process can easily be integrated in a production line and an operational prototype has been developed. In their early stage of development, Spin-Ion Technologies focus on two primary business lines:
Development of advanced processes in association with established MRAM and Hard Disk Drive companies
Development and commercialization of R&D tools, in association with established equipment manufacturers. At long term, their final goal is to develop and manufacture flagship magnetic materials for the non-volatile memory market.
Spin-Ion technologies is hosted by the Center for Nanoscience and Nanotechnology at University of Paris Saclay (C2N, https://www.c2n.universite-paris-saclay.fr/en/), one of the largest Nanoscience center in Europe, and benefit for its facilities including the largest academic clean room in France.